Intel deploys High-NA EUV lithography in production for first time (heise.de)

• Intel uses High-NA EUV for Panther Lake on 18A.
• System in Hillsboro, Oregon; used for research and optimization.
• TSMC avoids High-NA EUV due to cost, planning Low-NA until 2029.
• Intel plans broader deployment for 14A node in 2027.

"Intel Foundry has deployed an ASML High-NA EUV system (Twinscan Exe:5200B) for production of select layers of Panther Lake (Core Ultra 300) processors using the 18A node. The system, located in Hillsboro, Oregon, improves resolution to 9 nm. TSMC is delaying adoption due to cost (~€350M per system) and plans to rely on Low-NA EUV through at least 2029. Intel will expand High-NA EUV use with the 14A node expected in 2027."